ASML: Expects EUV lithography machine wafer output per hour to increase by 50% by 2030
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Gelonghui, February 23rd｜ASML stated that by increasing power, the power of the lithography machine's extreme ultraviolet (EUV) light source can be raised to 1000 watts. It is expected that by 2030, the hourly wafer output of EUV lithography machines can increase by 50%.
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